Mohali’s Karman Singh Talwar secures all India 2nd Rank in technical entry scheme of Indian Army

Chandigarh (The Uttam Hindu): Adding a yet another feather in the cap of Maharaja Ranjit Singh Armed Forces Preparatory Institute (MRSAFPI) SAS Nagar, Karman Singh Talwar, a cadet from the Institute, secured the 2nd rank in the All India merit list for the Technical Entry Scheme (TES)-52 of the Indian Army. The Army Headquarters in New Delhi released this merit list on Thursday evening. Along with Karman Singh Talwar, three more cadets from the Institute have also made it to the list. Manas Taneja secured the 22nd rank, Aniket Sharma achieved the 31st rank and Suryavardhan Singh obtained the 37th rank.

Karman Singh Talwar, son of Jatinder Pal Singh Talwar, an Additional General Manager of Indian Bank and Professor Ravjeet Kaur Talwar resident of SAS Nagar (Mohali), was also made it to the NDA-153 Merit List. Notably, the Technical Entry Scheme of the Indian Army trains candidates for the technical branches, including Engineers, Signals, and Electrical Mechanical Engineering (EME). TES candidates receive training at the Cadet Training Wings located in Pune (Maharashtra), Mhow (Madhya Pradesh) and Secunderabad (Telangana).

Congratulating the cadets for their achievement, Punjab Employment Generation, Skill Development and Training Minister Mr. Aman Arora stated that this is a proud moment as it signifies these young boys’ first step toward becoming future officers of the Defence Forces of India. He wished them all the best for their future endeavours.

MRSAFPI’s Director Major General Ajay H. Chauhan, VSM, also congratulated the cadets and urged them to make Punjab and the country proud. He mentioned that the Institute has committed itself to training cadets for the Technical Entry Scheme (TES) in addition to the NDA. In the past two years, six cadets from the Institute have been selected for the TES and are currently undergoing training. He also announced that the admission process for the 15th Course will begin soon.